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Germanium target for semiconductor

The germanium sputtering target is composed of high-purity germanium metal. It is a hard and brittle material with a semi-metallic, off-white appearance. It has a density of 5.35 g/cc, a melting point of 937°C, and a vapor pressure of 10 -4 Torr at 1,167°C. In the production of optical storage media and optical coatings, it is often evaporated under vacuum to form layers. Other uses of this material are as alloying agents and catalysts.
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Germanium target preparation process

Material preparation-Zone melting-Chemical analysis-Forging-Rolling-Annealing-Metallographic inspection-Machining-Dimensional inspection-Cleaning-Final inspection-Packaging

 

Application of germanium sputtering target

    

Application areas cover industries such as infrared optics, solar cells, optical fiber communications, semiconductor special gas, and PET catalysts.

 

Other alloy forms of germanium target

    

Germanium copper, gold germanium, germanium antimony tellurium alloy targets, etc.


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